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Micafluid is the world leader in engineering and development of insulating oil and insulating gas gas treatment plants.Get price

(PDF) Comparison of insulating gas and CF4 Plasma Treatment for Surface

Comparison of insulating gas and CF4 Plasma Treatment for Surface Hydrophobization of PET Polymer (Ulvac-Phi, Inc., Kanagawa, Japan, 2006) from the effect of insulating gas/O2 plasma chemistry on the etchingGet price

sf 6 Gas Systems II - micafluid.pt

Sulfr hexafluoride Gas Systems II - micafluid.ptGet price

sf6 gas plasma treatment for leakage current reduction of AlGaN

Sep 01, 2018 · The O 1s sub-peak at 532.4 eV without SF 6 treatment is related to loosely bonded oxygen at the surface, which is responsible for the high leakage current. During the following SF 6 treatment, the surface was passivated by fluorine atoms removing the loosely bonded oxygen.Get price

Effects of Treatment Time by Sulfur Hexafluoride (Sulfr hexafluoride) Plasma

Results showed that Sulfr hexafluoride plasma treatment can improve water resistance properties of paperboard significantly, beginning with only a 2 s treatment time (p ≤ 0.05), whereas oil resistanceGet price

Effect of sf6 gas plasma treatment on hydrophobicity improvement

is circular in shape and having the treatment area of 200 cm2. The sf 6 gas used in all experiment has the purity of 99.99%. The plasma operating conditions were set at the pressure of 0.005, 0.05, 0.5 and 1 torr with RF power of 25, 50 and 75 watts. The treatment times was fixed at 1 minute. It was observed that at RF power higher than 75Get price

Plasma etching of Si and SiO2 in Sulfr hexafluoride–O2 mixtures: Journal of

Jun 04, 1998 · The products of reaction and etch rates of Si and SiO2 in insulating gas‐O2 plasmas have been studied as a function of feed composition in an alumina tube reactor at 27 mHz, 45 W, and 1 Torr. There is a broad...Get price

Gas-phase reactions in plasmas of SF 6 with O 2 : Reactions

The plasma chemistry of sf6 gas/O2 mixtures is particularly complicated because of the large number of possible reactions. Over a wide range of conditions, products including SF4, SOF4, SOF2, and SO2F2 can be formed but thre is considerable uncertainty about the major reactions which contribute to the formation of these species. In this work reactions of oxygen atoms with SOF2 and fluorine atomsGet price

SimulationsofSiandSiO EtchinginSF +O Plasma

SimulationsofSiandSiO2 Etchinginsf 6+O2 Plasma 481 with SF5 radicals (Eq. (1.3)). At 27% O2, the concen- tration of F atoms approaches the maximum value. At this point, almost all SF5 radicals in gaz sf6 + O2 plasmaGet price

360rea.ch - Oem Voc Solution For Sale

In China, we are a leader in recovering and reusing Sulfr hexafluoride gas, has 22 years’ experience in providing sf6 gas gas treatment services for 95% of domestic power systems. gaz sf6 Service-team We provide full set equipment and service, including sf 6 gas measurement, Sulfr hexafluoride gas treatment, gaz sf6 gas equipment maintenance and professional training.Get price

Oxidation of sulfur hexafluoride - ScienceDirect

J. inorg, nucl. Chem., 1969, Vol. 31, pp. 675 to 683. Pergamon Press. Printed in Great Britain OXIDATION OF SULFUR HEXAFLUORIDE BERNARD SIEGEL and PETER BRE1SACHER Aerospace Corporation, E1 Segundo, Calif. 90045 (First received 12 July 1968; in revised form 9 September 1968) Abstract- Although insulating gas is extraordinarily inert toward oxygen, reaction can be initiated by the elec- trical explosionGet price

Myth About sf6 gas Gas In Electrical Equipment

Apr 12, 2021 · This is just the UK, Sulfr hexafluoride stays in the atmosphere for a minimum 1000 years where as CO2 100 years. Sulfr hexafluoride is on the increase the US expect a 6.2% increase over the next 6 years. gaz sf6 might not damage the Ozone but it will accelerate Global Warming given the fact that it stays in the atmosphere longer can cause more damage over a longer period of time.Get price

Passivation mechanisms in cryogenic Sulfr hexafluoride/O2 etching process

Oct 15, 2003 · Passivation mechanisms of Si trenches involved in SF 6 /O 2 cryogenic plasma etching were investigated in order to better control the process and avoid defects. Trench sidewalls and profiles were ex situ characterized geometrically by SEM and chemically by spatially resolved XPS experiments.Get price

Journal of Physics: Conference Series OPEN ACCESS Related

micromachining of silicon using an sf6 gas/O2 inductively coupled plasma F Jiang, A Keating, M Martyniuk et al.-Low-pressure nonequilibrium plasma for a top-down nanoprocess Toshiaki Makabe and Takashi Yagisawa-Recent citations Electron collision cross sections of CHF 3 and electron transport in CHF 3 and CHF 3 Ar mixtures Satoru Kawaguchi et al-Get price

High-aspect-ratio deep Si etching in sf6 gas/O2 plasma. II

Jul 28, 2010 · In this article, the authors focus on the profiles formed by high-aspect-ratio deep Si etching with sf 6/O2 plasma mixtures. One of the most serious problems for deep Si etching processes is lateral...Get price

Problems of the application of N2/Sulfr hexafluoride mixtures to gas

Sep 21, 2001 · Abstract In designing a gas‐insulated bus (GIB) using N2/insulating gas mixtures, there are many application problems, such as the mixture pressure needed in order to maintain the required dielectric and heat...Get price

Metal Phosphate Catalysts Effective for Degradation of Sulfur

sf6 gas decomposed stably over AlPO4, CePO4, YPO4, and Zr3(PO4)4 at 800−1000 K, but Ca2P2O7, Mg2P2O7, and Sr2P2O7 were less active. Active catalysts crystallized during the reaction. SO3, SO2F2, and HF were obtained as major products. SO3 was selectively formed over YPO4 and Zr3(PO4)4, but SO2F2 formed over AlPO4 and CePO4 in a significant selectivity at lower temperatures. DecompositionGet price

High-temperature etching of SiC in sf6 gas/O2 inductively coupled

Nov 17, 2020 · Sulfur hexafluoride SF 6 (GOST TU 6-02-1249-83, purity 99.998%) was used as the etchant main gas. Etching processes were performed in a mixture of SF 6 and O 2 (high purity, TU...Get price

Decomposition of sf 6 in an RF Plasma Environment

Sulfr hexafluoride clearly increased from 37.79 to 95.68% because of an increase in power from 5 to 20 W. When the power exceeded 40 W, η Sulfr hexafluoride exceeded 99%. When oxygen was introduced into the reactor (feed O 2 /SF 6 ratio = 2.0), η sf6 gas was ~10% less than when no oxygen was added (from 28.61 to 86.09% as the power rose from 5 to 20 W). The addition of oxygenGet price

JP2007103876A - Etching method and etching apparatus - Google

A total gas mixed with a mixed gas composed of sf6 gas and O2 or a mixed gas composed of Sulfr hexafluoride, O2 and SiF4 with respect to a silicon substrate or a silicon substrate including a silicon oxide dielectric layer.Get price

sf 6 Equipment from DILO available in Canada

installed converts the values measured into the sf 6 volume percentage. Easy rinsing after the measuring process - and the device can be used again for another gas compartment immediately. The device can also be used for measurements of pure insulating gas gas or sf6 gas gas mixtures containing N2 or CF4. In this case we kindly askGet price

Sulfur Hexafluoride Sulfr hexafluoride Safety Data Sheet SDS P4657

Sulfur hexafluoride Safety Data Sheet P-4657 This SDS conforms to U.S. Code of Federal Regulations 29 CFR 1910.1200, Hazard Communication. Date of issue: 01/01/1979 Revision date: 11/23/2016 Supersedes: 01/28/2015Get price

Inducing surface hydrophobization on cornstarch film by sf6 gas

treatment and surface-induced design can be created (Behnisch et al., 1998; Simão et al., 2007; Zanini et al., 2008). Sulfur hexaflu-oride, Sulfr hexafluoride, is a source of fluorine for etching processes under radio frequency plasma (RF) conditions as well as a gas-phase dielec-tric used in high-power electrical and physics industries. Fluorine atomsGet price

The effects of several gases (He, N2, N2O, and sf6 gas) on gas

The amount of gas trapped in the lungs at a given inflation-deflation rate was related to the solubility of the gas divided by the square root of its molecular weight. During the second part of the study the effect of different mixtures of insulating gas and O2 on the amount of gas trapped was examined.Get price

sf6 gas Transmitter - Draeger

Sulfr hexafluoride Transmitter Product Information, en-master. The Sulfr hexafluoride transmitter is ideally suited for the gas measurement of sulfur hexafluoride in the field of high voltage engineering. The transmitter can be used both as a gas leak detector and to monitor the gas quality in gas-insulated switchgear (GIS) or transformers. DownloadGet price

Effect of air and sulfur hexafluoride (gaz sf6) tamponade on

1. Can J Ophthalmol. 2017 Jun;52(3):269-272. doi: 10.1016/j.jcjo.2016.11.004. Epub 2016 Dec 23. Effect of air and sulfur hexafluoride (insulating gas) tamponade on visual acuity after epiretinal membrane surgery: a pilot study.Get price

Sulfur hexafluoride | F6S - PubChem

Sulfur hexafluoride is a sulfur coordination entity consisting of six fluorine atoms attached to a central sulfur atom. It is the most potent greenhouse gas currently known, with a global warming potential of 23,900 times that of CO2 over a 100 year period (sf 6 has an estimated lifetime in the atmosphere of between 800 and 3,000 years).Get price

Silicon doping effect on Sulfr hexafluoride/O2 plasma chemical texturing

A sf 6/O2 plasma chemical etching is proposed as a process to texture n- and p-doped c-Si (100) by chemical reactivity of active fluorine species, under conditions avoiding ion bombardment and sputt...Get price

Drug-coated balloon versus uncoated percutaneous transluminal

Objectives: To assess the longer-term safety and efficacy of the IN.PACT Admiral (MDT-2113) drug-coated balloon (DCB) for the treatment of de novo and non-stented restenotic lesions in the superficial femoral and/or proximal popliteal arteries versus uncoated percutaneous transluminal angioplasty (PTA) in a Japanese cohort.Get price