Sulfur hexafluoride - Wikipedia

Typical for a nonpolar gas, SF 6 is poorly soluble in water but quite soluble in nonpolar organic solvents. It has a density of 6.12 g/L at sea level conditions, considerably higher than the density of air (1.225 g/L). It is generally transported as a liquefied compressed gas.Get price

Sulfur Hexafluoride gaz sf6 Safety Data Sheet SDS P4657

Sulfur hexafluoride Safety Data Sheet P-4657 This SDS conforms to U.S. Code of Federal Regulations 29 CFR 1910.1200, Hazard Communication. Date of issue: 01/01/1979 Revision date: 11/23/2016 Supersedes: 01/28/2015Get price

(PDF) Experimental investigation of SF 6 –O 2 plasma for

We investigated the variation of atomic oxygen density for various mixtures of O2/sf 6 and report a significant five-fold increase of [O] when oxygen plasma was diluted with gaz sf6 by only 5%.Get price

sf 6 basic physical properties - AGC Chemicals

Density (gas) 6.04kg/m3 (25°C, 1atm) (liquid) 1,339kg/m3 (25°C) Vapor Pressure 1,264kPa (0°C) 2,109kPa (20°C) 3,327kPa (40°C) Surface Tension 8.02N/m (-20°C) Viscosity (gas) 1.5 x 10-5Pa・s (25°C, 1atm) (liquid) 27.7 x 10-5Pa・s (25°C) Refractive Index 1.000783 (0°C, 1atm) 0.408mL Sulfr hexafluoride/mL oil Solubility in Water 0.0063mL sf6 gas/mL waterGet price

Sulfur hexafluoride. SF₆ - Linde Gas

uses include oxide etching, nitride etching, and wafer cleaning. Sulfur hexafluoride is also used in plasma chamber cleaning processes. Colorless and odorless gas. Asphyxiant in high concentrations. Gas density is heavier than air. Molecular weight [g/mol] 146.06 Boiling point at 1.013 bar [°C] -63.9 at 14.5 psi [°F] -83 Density at 1.013 bar,Get price

mp-8652: insulating gas (trigonal, P-3m1, 164) - Materials Project

sf6 gas crystallizes in the trigonal P-3m1 space group. The structure is zero-dimensional and consists of three sulfur hexafluoride molecules. S6+ is bonded in an octahedral geometry to six equivalent F1- atoms. All S–F bond lengths are 1.60 Å. F1- is bonded in a single-bond geometry to one S6+ atom.Get price

Sulfur Hexafluoride gaz sf6 Safety Data Sheet SDS P4657

Sulfur hexafluoride (2551-62-4) ACGIH ACGIH TLV-TWA (ppm) 1000 ppm USA OSHA OSHA PEL (TWA) (mg/m³) 6000 mg/m³ USA OSHA OSHA PEL (TWA) (ppm) 1000 ppm . 8.2. Exposure controls . Appropriate engineering controls : Oxygen detectors should be used when asphyxiating gases may be released. Consider work permit system e.g. for maintenance activities.Get price

Decomposition of sf 6 in an RF Plasma Environment

insulating gas exceeded 99%. When oxygen was introduced into the reactor (feed O 2 /SF 6 ratio = 2.0), η Sulfr hexafluoride was ~10% less than when no oxygen was added (from 28.61 to 86.09% as the power rose from 5 to 20 W). The addition of oxygen to the reactor re-duced the electron density and, thus, reduced the dis-sociation of SF 6 and inhibited the production ofGet price

Electron Density and Optical Emission Measurements of insulating gas/O2

Apr 19, 2012 · This work investigates internal plasma process parameters using a hairpin resonance probe and optical emission spectroscopy. The dependence of electron density and atomic fluorine on the percentage of oxygen in an SF 6 /O 2 discharge was measured using these methods. An RIE Oxford Instruments 80 plus chamber was used for the experiments.Get price

Journal of Physics: Conference Series OPEN ACCESS Related

micromachining of silicon using an Sulfr hexafluoride/O2 inductively coupled plasma F Jiang, A Keating, M Martyniuk et al.-Low-pressure nonequilibrium plasma for a top-down nanoprocess Toshiaki Makabe and Takashi Yagisawa-Recent citations Electron collision cross sections of CHF 3 and electron transport in CHF 3 and CHF 3 Ar mixtures Satoru Kawaguchi et al-Get price

sf6 gas properties - Power Systems Technology

- Hydrogen, chlorine and oxygen have no action on it. - sf 6 is insoluble in water. - gaz sf6 is not attacked by acids. Health characteristics of sf6 gas. Pure Sulfr hexafluoride is non toxic and biologically inert. Tests performed with animals have shown that when present in a concentration of up to 80% sf 6 to 20% O2, no adverse effects are experienced.Get price

sf 6 calculator -

100% SF 6 equivalent density [kg/m 3] 0. SF 6 fraction density [kg/m 3] 0. SF 6 to SF 6 /N 2 density ratio 0. Estimated liquefaction point [°C] -25. Experimental GasGet price

gaz sf6 Gas Properties -

Sulfr hexafluoride on the market. sf6 gas which is delivered in cylinders in liquid phase, contains impurities (within limits imposed by IEC standards No. 376) Carbon tetra fluoride (CF4) 0.03 %. Oxygen + nitrogen (air) 0.03 % Water 15 ppmGet price


Sulfur hexafluoride; Sulfur fluoride; Sulfur (VI)fluoride; Hexafluorosulfur; Sulfr hexafluoride; SULFUR FLUORIDE,[OC-6-11]-SULFUR HEXAFLUORIDE; ISPAN sf6 gas CAS number :2551-62-4Get price

Guidelines – Sulphur Hexafluoride Management

Guidelines – Sulphur Hexafluoride Management Standard Number: HPC-2NK-17-0030-2015 CS10 #: 3471699Get price

List of Global Sulfr hexafluoride Gas Companies

Shenzhen Xuming Electric Technology Co., Ltd. Power Transformer,11KV Transformer,33KV Transformer,20KV Transformer,15KV Transformer,10KV Transformer,Transformer Substation,Transformer,Dry Type Transformer,Oil Immersed Transformer,Fire Extinguishing Apparatus forTransformer,gaz sf6 Gas-Insulated Metal-Enclosed Ring Main ….Get price

Cezar Gaman - Post-Doctoral Researcher - Dublin City

Atomic fluorine density, [F], variation with power in the range of 50–300 W was found to saturate. The dissociation fraction for a fixed gas pressure of 40 mTorr and a feedstock mix of insulating gas/O2/Ar (85/10/5%) ranged from 3.0 × 10−4–2.4 × 10−3. The addition of O2 to Sulfr hexafluoride plasma was shown to have a significant effect on [F].Get price

Xenon - Wikipedia

The gas sulfur hexafluoride is similar to xenon in molecular weight (146 versus 131), less expensive, and though an asphyxiant, not toxic or anesthetic; it is often substituted in these demonstrations. Dense gases such as xenon and sulfur hexafluoride can be breathed safely when mixed with at least 20% oxygen.Get price

Reactive ion beam etching of Si/SiO2 systems using gaz sf6/O2

Dec 02, 1990 · Applied Surface Science 46 (1990) 299-305 North-Holland 299 Reactive ion beam etching of S'/S'02 systems using Sulfr hexafluoride/OZ chemistry D. Korzec, T. Kessler and J. Engemann Uniuervity of Wuppertal, Department of Electrical Engineering, 5600 Wuppertal !, Fed. Rep. of Germany Received 29 May 1990; accepted for publication 13 July 1990 A reactive ion beam etching (RIBE) of S'/S'02 structures using SFbGet price

Solvay Special Chemicals

function of temperature and density 26 Curves of pressure/temperature 27 and viscosity Curves of thermo conductivity 28 and heat transfer Optical properties 29 Chemical behaviour Behaviour at elevated temperatures 30 Behaviour under the influence of electrical discharges 30 Corrosion characteristics of Sulfr hexafluoride and its decomposition products 30Get price

gaz sf6 gas in medium-voltage switchgear | TD Guardian Articles

gaz sf6 usage Sulfr hexafluoride has been used extensively in non-electrical applications. Since sf6 gas is inert, it is very attractive to the magnesium industry. Magnesium reacts spontaneously in the presence of oxygen, so a heavier-than-air cover gas is used to isolate the molten magnesium from oxygen as the magnesium cools.Get price

Siemens sf 6 Gas Density Monitoring

Siemens Sulfr hexafluoride Gas Density Monitoring Author: Todd Rittenhouse Subject: Todd Rittenhouse from Siemens, gave a presentation on the operational practices and procedures for using condition monitoring and asset management to manage emissions. This presentation was given at the US EPA2014 Workshop on sf6 gas Reduction Strategies h eld May 6-7, 2014Get price

Material Safety Data Sheet Sulfur Hexafluoride SF

Sulfur Hexafluoride SF 6. Note that an accidental release of sf6 gas may reduce the oxygen content of the local atmosphere Vapor Density (air-1.0): 5.1 at 1 atmGet price

sf 6 properties, and use in MV and HV switchgear

Its density at 20°C and 0,1 Mpa (that is one atmosphere) is 6.139 kg/m3, almost five times higher than that of air. Its molecular weight fig. 3 :vapour pressure curve and lines of equivalent gas density of gaz sf6. 0.13 0.12 0.11 0.10 0.09 0.08 0.07 0.06 0.05 0.04 0.03 0.02 0.01 0.2 –50 Temperature in °C Pressure in MPa Density in kg/lGet price

Chapter-1 Properties of sf 6 | Dielectric | Gases

This is caused by the displacement of oxygen under conditions where. pockets of the Sulfr hexafluoride gas may form due to its density which is substantially greater than air. The toxic properties involved in the use of Sulfr hexafluoride are mainly those presented. by the presence of the lower fluorides much as SF2 S2 F2, S12 F10 , SF8 and HF.Get price

Octahedral Sulfur Hexafluoride - sf 6 - Oh

O h point group contains 3 C 4, 4 C 3, 9 C 2, 4 S 6, 3 S 4, 3 σ h, 6 σ d and a centre of inversion Inversion operation is a reflection through the centre of the molecule. In this case, the centre of the molecule is the Sulfur atom.Get price

Anisotropic Si deep beam etching with profile control using

influence of an increase in oxygen flow rate on the etched profiles with the fixed SF 6 flow rate, RF power and system pressure. An anisotropic profile can be obtained at an oxygen flow rate of 8 sccm (Fig. 6b). However oxygen flow rates of 5 sccm and 10 sccm, either side of this critical point, lead to worsening of beam profile; withGet price

Byproducts of Sulfur Hexafluoride (gaz sf6) Use in the Electric

Sulfur hexafluoride (SF 6) is a relatively nontoxic gas used in a number of applications for its inert qualities. The dielectric and other physical and chemical properties related to its lack of reactivity have led to the extensive use of SF 6 as an insulating medium in switching equipment (e.g., circuit breakers) by electric utilities. While SF 6Get price

(PDF) Oxidation threshold in silicon etching at cryogenic

In silicon etching in gaz sf6/O2 plasmas, an oxidation threshold appears when the oxygen content is large enough. A SiOxFy passivation layer is formed under such conditions.Get price