GE Expands insulating gas-free High-Voltage Product Portfolio to Help

Sep 26, 2019 · GE is expanding its sf 6-free portfolio to include all key high-voltage levels by 2025 GE’s Green Gas for Grid (g3) high-voltage products reduce global warming potential (GWP) by more than 99%, while offering proven technical performance Since 2017, installation of more than 386,000 tons of CO2 equivalent have been avoided on the grid as a result of GE’s g3 high-voltage products ParisGet price

Precision plasma etching of Si, Ge, and Ge:P by sf 6 with added O2

Mar 31, 2014 · The impact of the O2 content in sf 6-O2 gas mixtures on the etch rate and sidewall profile of silicon (Si), germanium (Ge), and phosphorous doped germanium (Ge:P) in reactive ion etching has been st...Get price

(PDF) Comparison of etching processes of silicon and

As a result, with a Sulfr hexafluoride-O2 proportion of 60%, an optimized RMS roughness of 0.9 nm has been revealed for Ge surfaces after etching with a selectivity of over 4 for vertical etching to horizontalGet price

Silicon Nanostructuring Using sf6 gas/O2 Downstram Plasma Etching

12 Wongwanitwattana C, Shah VA, Myronov M, Parker EHC, Whall T, Leadley DR. Precision plasma etching of Si, Ge, and Ge:P by insulating gas with added O2. Journal of Vacuum Science Technology A. 2014;32(3):031302. [ Links ]Get price

Precision plasma etching of Si, Ge, and Ge:P by Sulfr hexafluoride with added O2

adshelp[at]cfa.harvard.edu The ADS is operated by the Smithsonian Astrophysical Observatory under NASA Cooperative Agreement NNX16AC86AGet price

g3 - insulating gas Free Solutions

SF 6 insulating gas (or Sulphur Hexafluoride) had been the standard gas used inside high voltage electrical equipment as an insulating and arc-quenching medium. However, SF 6 insulating gas is also listed as an extremely potent greenhouse gas according to the Kyoto protocol, with 23,500 times the comparative Global Warming Potential of CO 2 and a lifetime of 3,200 years in the atmosphere.Get price

GE Reports CEE — GE Aviation skyrocketing in Romania

GE Aviation in Romania is taking new heights, reveals the recent article in influential Romanian business daily Ziarul Financiar and explains how the expected sustainable growth and earnings in the global commercial aerospace sector in 2015 contributes to the boost of the industry in the Eastern European country and worldwide. Utilizing theGet price

Global Web Sites | General Electric

Access GEregional and business websites here. Where research meets reality to propel GE and the world forward. GEinnovation engine where ideas become reality to create a better world and deliver differentiated tech across the companyindustrial portfolio.Get price

EU Report Highlights Sulphur Hexafluoride Countdown

GE has announced a g3 roadmap (8) until 2025 to extend its sf 6-free portfolio up to 420kV which also includes an EU Life (9) funded project. AirPlus is a gas mixture using Novec 5110 Insulating Gas from 3M and is used by ABB in MV equipment, and by Hitachi ABB Power Grids in HV equipment.Get price

Surface Reactivity of Silicon and Germanium in CF4 -O2

The plasma etching of silicon and silicon dioxide in CF 4.02 mixtures has been studied as a function of feed· gas composition in a 13.56-MHz plasma generated in a radial-flow reactor at 200 W andGet price

Precision plasma etching of Si, Ge, and Ge:P by Sulfr hexafluoride with

The impact of the O2 content in Sulfr hexafluoride-O2 gas mixtures on the etch rate and sidewall profile of silicon (Si), germanium (Ge), and phosphorous doped germanium (Ge:P) in reactive ion etching has been studied. The characteristics of etch rate and sidewall profile are greatly affected by the O2 content.Get price

g3 – In the air | Think Grid

Dec 22, 2017 · The latest developments to GE’s Sulfr hexafluoride gas replacement for transmission equipment, g3, have got a lot of attention. To keep all stakeholders up to date and satisfy their curiosity, this article aims to respond to the numerous questions and comments that g3 continues to generate.Get price

Deep reactive ion etching of in situ boron doped LPCVD Ge0

Ge 0.7Si 0.3 Etch selectivity Resonator abstract This paper reports on deep reactive ion etching (DRIE) of in situ highly boron doped low pressure chem-ical vapor deposited Ge 0.7Si 0.3 alloy in SF 6 and O 2 plasma. The effect of RF power, SF 6 flow, O 2 flow and temperature on the etch rate of Ge 0.7Si 0.3 films with a boron concentrationGet price

News Room : GE Grid Solutions

The key difference between g3 and insulating gas is that g3 is a gas mixture while insulating gas is a single gas. Elodie Laruelle, GE Grid Solutions Eco-design Engineer, explains: “ The critical point for a gas mixture is to maintain the homogeneity of the two components (NovecTM and CO2) throughout the filling process.Get price

Byproducts of Sulfur Hexafluoride (insulating gas) Use in the Electric

Byproducts of Sulfur Hexafluoride (SF 6) Use in the Electric Power Industry Prepared for U.S. Environmental Protection Agency Office of Air and RadiationGet price

GE Grid Solutions

11 months ago Over 10,000 GE Resources: 1,100+ videos 45 interactive apps 3D product explorers 35 curated content channels 1,100+ videos, 40+ interactive apps 3D product explorers, and over 30 curated content channels with whitepapers, case studies, how-to-videos and more.Get price

Emission and Electrical Measurements to Assess Actinometry in

In SiC etching plasma devices, we have recorded plasma emission from Ar, F and O atoms in sf6 gas/Ar/O2 RF discharges as a function of pressure, input power and mixture fraction. At fixed power, the emission intensities rise nearly linearly with increasing pressure between 100 and 300 mTorr; with pressure increases to 600 mTorr, the emission intensity rolls off due to the increase in collisionalGet price

insulating gas, Sulfur Hexafluoride | Concorde Specialty Gases

insulating gas, Sulfur Hexafluoride . Sulfur Hexafluoride (gaz sf6) is an inorganic, colorless, odorless, and non-flammable gas. Sulfr hexafluoride primary use is in the electrical industry as a gaseous dielectric medium for various voltage circuit breakers, switchgear and other electrical equipment, often replacing oil filled circuit breakers (OCBs) that can contain harmful PCBs.Get price

Substation Testing and Commissioning: SO2 MEASUREMENT IN Sulfr hexafluoride GAS

Sep 05, 2013 · Gastec Gas Sampling Pumps are used to take the sample of gaz sf6 gas Collect the gaz sf6 gas in a polythene bag from the equipment Non returnable value. Take a fresh Detector Tubes and broke two edges and fix one edge with Gas sampling pump, insert the other end in to gas collected polythene bag.Get price

Etch rates for micromachining processing-part II

Fused Quartz Wafer: Wafers of General Electric 124 or NSG N fused quartz source material, % silicon dioxide, with amorphous structure (as opposed to true crystalline quartz). This material is commonly referred to simply as “quartz.” It is compatible with silicon-wafer processing steps, and may find application as a substrate in RF MEMS as it isGet price

Wind switchgear - Switchgear | ABB

In addition to the super-slim 36 and 40.5 kV variants, SafePlus is available in 12 and 24 kV ratings, in modules and in a wide variety of configurations, all with the same user interface and dimensions.Get price

Dry Etch at UCSB - NNIN

MHA Etching-InP – Parallel Plate Above: InP Etching. CH 4/H 2/Ar 4/20/10sccm, 75 mTorr, 450V, 43nm/min, SiN mask. O 2 clean for 5 min at 300V at end to remove polymers from sampleGet price

sf 6 Molecular Geometry, Lewis Structure, Shape, and Polarity

gaz sf6 Molecular Geometrysf 6 PropertiesLewis Structure of gaz sf6Is Sulfr hexafluoride Polar Or non-polar?Sulfur hexafluoride has a central sulfur atom around which one can see 12 electrons or 6 electron pairs. Thus, the Sulfr hexafluorideelectron geometry is considered to be octahedral. All the F-S-F bonds are 90 degrees, and it has no lone pairs.Get price

Desorption of Kr (or Kr85) and Sulfr hexafluoride from Vitreous and

The diffusion and solubility coefficients of He in various inorganic glasses are well known, while only few data for Ne and Ar are available (1–6). Kr and sf6 gas, a fairly inert and nearly spherical...Get price

The effect of inert gas choice on multiple breath washout in

Dec 01, 2017 · N2- and Sulfr hexafluoride-based tests were performed during spontaneous quiet sleep in 10 healthy infants aged 0.7-1.3 yr using identical hardware. Differences in breathing pattern pre and post 100% O2 and 4% insulating gas exposure were investigated, and the results obtained were compared [functional residual capacity (FRC) and lung clearance index (LCI)].Get price

Xuezhi Ma - Postdoctoral Researcher - Texas AM University

The surface roughness of the Ge after RIE can be sufficiently reduced by introducing Sulfr hexafluoride-O2 etching steps into the CF4-O2 etching process, while maintaining a relatively large ratio of verticalGet price

Switchgear | ABB

We help plant operators understand how digital switchgear can help overcome the hidden costs of traditional switchgear by improving your ability to collect, access, analyze and take action on the data your equipment and infrastructure creates, helping you achieve cost savings of up to 30 percent.Get price

Processes | Utah Nanofab

Allwin 610 RTP/RTA with O2, N2, Ar, H2 forming gas, 200-1250C; ETCH RIE and DRIE. STS Aspect ICP DRIE: time-multiplex Si etch (anti-footing) Oxford Plasmalab 100+ ICP time-multiplex cryo DRIE sf 6, CF4, CHF3, O2, Ar, Cl2, HBr, N2; Oxford Plasmalab 80+ multipurpose (sf6 gas, CF4, O2, Ar) Technics PEII H2O, O2 descum resist stripGet price

O2matic brings oxygen therapy into the digital age.

O2matic brings oxygen therapy into the digital age.New Danish-developed system monitors and doses oxygen based on the patient’s current conditionOxygen therapy is becoming more precise and safe. The automated system keeps the patient’s oxygen saturation levels in the correct range 85% of the time, while this is the case for only 47% of the time with manual treatment. This significantlyGet price